Lam Research

2026-27 · Internship

1. 1

   Resume shortlist

   Direct resume shortlisting (no test)
   eliminatory

   No online test or group discussion. Process-oriented projects (for example thin-film deposition modelling) were the filter.

2. 2

   Technical interview

   Three technical interviews, about 30 min each
   Zoom30 min

   ALD vs CVD · PEALD vs thermal ALD · plasma generation and pressure · sputtering yield vs incidence angle · deposition non-uniformity · purge step · etching selectivity · NAND vs DRAM · ICP vs CCP · project process modelling

   Fundamentals first, then follow-ups into the project. No dedicated HR round; some process-related behavioural questions inside the technical rounds.

Advice from candidates

9 pieces of advice, in their own words. Names removed.

• You have to design your resume with fabrication and process oriented work in order to get shortlisted.

  resume · 2026-27

• So having worked on a semi-conductor process-oriented project is crucial as that is what they are looking for in their role. You should have knowledge and experience with the process. It is fine even if you had done a fabrication related course too, as I have seen in the case of my other friends who got shortlisted.

  resume · 2026-27

• It is really important to calm yourself in the interviews and maintain a structured flow of concepts rather than thinking in a clumsy or scattered manner. You can practice better by utilizing AI, ask it to question your fundamentals rigorously and answer them as a real interview.

  interview · 2026-27

• It is often good practice to try to answer a question even if you do not know the exact answer (unless it is purely fact-based), by thinking analytically based on your existing knowledge. The interviewer is not only testing your knowledge but also your ability to approach a problem and reason through it. So, do not immediately back out if you feel you do not know the answer. Try your best to reason it out, but clearly mention when you are answering based on your understanding or intuition and are not completely sure.

  interview · 2026-27

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Question patterns reported

The kind of problem, not the problem itself. Our practice questions are written to match these patterns.

• Technicalcompare ALD with CVD and list advantages
• Technicalcauses and fixes for non-uniform deposition
• Technicaleffect of pressure on plasma ignition
• Technicalhow sputter yield changes with ion angle
• Technicaltool workaround for modelling purge